3923109010

Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers

Reference date: 2026-10-11
Last TARIC file date: 2026-10-08

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